Colloidal Silica Suspension 50 nm Alkaline

Colloidal silica suspension for final polishing of metallographic samples.

The suspension can be mixed with etchants to enhance the polishing action.

Silica concentration 585 g/l
Median (50%) 50 nm
pH 9.5 – 10.5

Contains anti-drying agent. Shake before use

Category:
  • Akasel Mag-Chemal polishing cloth in black, crafted from synthetic foam with a magnetic backing. Ideal for final polishing in metallography.

    Polishing Cloths

    Mag-Chemal

  • Akasel Aka-Chemal polishing cloth in black, crafted from synthetic foam with a self-adhesive PSA backing. Perfect for final polishing in metallography.

    Polishing Cloths

    Aka-Chemal

Contact us