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Description
Content available: 1 l, 5 l
SDS Colloidal Silica Suspension 50 nm (EN)
Oxide Polishing Product Brochures (EN)
Colloidal Silica Suspension 50 nm Alkaline
Colloidal silica suspension for final polishing of metallographic samples.
The suspension can be mixed with etchants to enhance the polishing action.
Silica concentration 585 g/l
Median (50%) 50 nm
pH 9.5 – 10.5
Contains anti-drying agent. Shake before use
