Colloidal Silica Suspension 50 nm Alkaline

Colloidal silica suspension for final polishing of metallographic samples.

The suspension can be mixed with etchants to enhance the polishing action.

Silica concentration 585 g/l
Median (50%) 50 nm
pH 9.5 – 10.5

Contains anti-drying agent. Shake before use

Additional information

Content available

1 l, 5 l

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